Dry etch technology : 9-10-September 1991, San Jose, California

著者

• Ranadive, Deepak
• Society of Photo-optical Instrumentation Engineers

書誌事項

Dry etch technology : 9-10-September 1991, San Jose, California

Deepak Ranadive, chair ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1593）

SPIE, c1992

注記

"Part of a two-conference program on Microelectronic Manufacturing Science and Technology held at SPIE's 1991 Symposium on Microelectronic Processing Integration, 9-13 September 1991, in San Jose, California"--P. v

Includes bibliographical references and index

• NII書誌ID(NCID): BA26306553
• ISBN:
  • 0819407240
• LCCN: 91067546
• LCCN: 89067546
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: viii, 222 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Plasma etching -- Congresses
  • LCSH : Microelectronics -- Materials -- Congresses
• 親書誌ID:
  • BA0022700X