Dry etch technology : 9-10-September 1991, San Jose, California

Author(s)

• Ranadive, Deepak
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Dry etch technology : 9-10-September 1991, San Jose, California

Deepak Ranadive, chair ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1593）

SPIE, c1992

Note

"Part of a two-conference program on Microelectronic Manufacturing Science and Technology held at SPIE's 1991 Symposium on Microelectronic Processing Integration, 9-13 September 1991, in San Jose, California"--P. v

Includes bibliographical references and index

Details

• NCID: BA26306553
• ISBN:
  • 0819407240
• LCCN: 91067546
• LCCN: 89067546
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: viii, 222 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Plasma etching -- Congresses
  • LCSH : Microelectronics -- Materials -- Congresses
• Parent Bibliography ID:
  • BA0022700X