Submicrometer metallization : the challenges, opportunities, and limitations : 23-25 September 1992, San Jose, California

著者

• Kwok, Thomas
• Kikkawa, Takamaro
• Shenai, Krishna
• Society of Photo-optical Instrumentation Engineers

書誌事項

Submicrometer metallization : the challenges, opportunities, and limitations : 23-25 September 1992, San Jose, California

Thomas Kwok, Takamaro Kikkawa, Krishna Shenai, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1805）

SPIE, c1993

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA26610816
• ISBN:
  • 0819410039
• LCCN: 92062654
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: ix, 344 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815/2
• 件名:
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Metallic films -- Congresses
  • LCSH : Metallizing -- Congresses
  • LCSH : Electrodiffusion -- Congresses
  • LCSH : Semiconductor-metal boundaries -- Congresses
• 親書誌ID:
  • BA0022700X