Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

Author(s)

• Resnick, Douglas J.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1263）

SPIE, c1990

Note

Proceedings of the SPIE Symposium on Microlithography

Includes bibliographical references

Details

• NCID: BA26792870
• ISBN:
  • 0819403105
• LCCN: 90060893
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: viii, 344 p.
• Size: 28 cm
• Parent Bibliography ID:
  • BA0022700X