Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California

Author(s)

• Patterson, David O.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California

David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1924）

The Society, c1993

• pbk.

Note

Includes bibliographical references and index

Details

• NCID: BA27103981
• ISBN:
  • 0819411582
• LCCN: 93084071
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: vii, 470 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC20 : 621.3815/31
• Subject Headings:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• Parent Bibliography ID:
  • BA0022700X