Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
(Proceedings / SPIE -- the International Society for Optical Engineering, v. 2194)
SPIE, c1994
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Includes bibliographical references and index