Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California

著者

• Nalamasu, Omkaram
• Society of Photo-optical Instrumentation Engineers

書誌事項

Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California

Omkaram Nalamasu chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2195）

SPIE, c1994

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA27423643
• ISBN:
  • 0819414905
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: xiii, 880 p.
• 大きさ: 28 cm
• 親書誌ID:
  • BA0022700X