Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California

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Bibliographic Information

Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California

Omkaram Nalamasu chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2195）

SPIE, c1994

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Note

Includes bibliographical references and index

Related Books： 1-1 of 1

  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

Details

  • NCID
    BA27423643
  • ISBN
    • 0819414905
  • Country Code
    us
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Bellingham, Wash., USA
  • Pages/Volumes
    xiii, 880 p.
  • Size
    28 cm
  • Parent Bibliography ID
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