Modeling of film deposition for microelectronic applications

Author(s)

• Francombe, Maurice H.
• Vossen, John L.

Bibliographic Information

Modeling of film deposition for microelectronic applications

edited by Stephen Rossnagel

（Thin films, v. 22）

Academic Press, c1996

Note

Includes bibliographical references and indexes

Details

• NCID: BA28758239
• ISBN:
  • 0125330227
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: San Diego ; Tokyo
• Pages/Volumes: xiv, 291 p., [3] p. of plates
• Size: 24 cm
• Subject Headings:
  • LCSH : Thin films
• Parent Bibliography ID:
  • BA25443322