Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.

著者

• Gelpey, J. C.

書誌事項

Rapid thermal and integrated processing V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.

editors, J.C. Gelpey ... [et al.]

（Materials Research Society symposium proceedings, v. 429）

Materials Research Society, c1996

注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.

「Nielsen BookData」 より

• NII書誌ID(NCID): BA28964616
• ISBN:
  • 1558993320
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pittsburgh, PA
• ページ数/冊数: xi, 389 p.
• 大きさ: 24 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Heat treatment -- Congresses
  • LCSH : Semiconductor doping -- Congresses
  • LCSH : Chemical vapor deposition -- Congresses
  • LCSH : Dielectrics -- Congresses
• 親書誌ID:
  • BA00013775