Electrochemical technology : innovation and new developments

Bibliographic Information

Electrochemical technology : innovation and new developments

edited by Noboru Masuko, Tetsuya Osaka and Yasuhiko Ito

Kodansha , Gordon and Breach, 1996

Available at  / 6 libraries

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

The electronics industry underwent a rapid evolution from thick to thin films during the last decade. Electrochemical technology played an important and often decisive role in the direction of this evolution. Applications include plating through mask technology, plating for thin film heads, plating for high density magnetic thin film, selective etching technology, etc. New electrochemical approaches have also been developed which will play key roles in the electronics industry. This book reports on the latest progress in electrochemical processes, including fundamentals and applications. Additional volumes dealing with more specific applications of electrochemistry are also planned.

Table of Contents

1. Image and Signal Processing 2. CCD Camera and Applications 3. CCD Delay Line and CCD Linear Sensor 4. The CCD Manufacturing Process 5. Advanced Surface Finishing for Electronics Application 6. Designing MCM Substrate Computers 7. Electroless Deposition of Metals and Control of Bath Activity and Film Quality in Electroless Copper 8. Electrochemical Micromachining Electrodeposition of Metals on Single Crystal Substrates 9. Molten Salt Electrochemical Deposition: Overview and Application 10. High-Temperature Electrochemical Synthesis of Intermetallides of Titanium in Molten Salts 11. Porous Silicon Formation: Theoretical Analysis

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Details

  • NCID
    BA29810243
  • ISBN
    • 9056990020
    • 4062076438
  • Country Code
    ja
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Tokyo,Amsterdam
  • Pages/Volumes
    xvii, 409 p.
  • Size
    25 cm
  • Subject Headings
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