Electrochemical technology : innovation and new developments
Author(s)
Bibliographic Information
Electrochemical technology : innovation and new developments
Kodansha , Gordon and Breach, 1996
Available at 6 libraries
  Aomori
  Iwate
  Miyagi
  Akita
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  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
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  Aichi
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  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
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  United Kingdom
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Note
Includes bibliographical references and index
Description and Table of Contents
Description
The electronics industry underwent a rapid evolution from thick to thin films during the last decade. Electrochemical technology played an important and often decisive role in the direction of this evolution. Applications include plating through mask technology, plating for thin film heads, plating for high density magnetic thin film, selective etching technology, etc. New electrochemical approaches have also been developed which will play key roles in the electronics industry. This book reports on the latest progress in electrochemical processes, including fundamentals and applications. Additional volumes dealing with more specific applications of electrochemistry are also planned.
Table of Contents
1. Image and Signal Processing 2. CCD Camera and Applications 3. CCD Delay Line and CCD Linear Sensor 4. The CCD Manufacturing Process 5. Advanced Surface Finishing for Electronics Application 6. Designing MCM Substrate Computers 7. Electroless Deposition of Metals and Control of Bath Activity and Film Quality in Electroless Copper 8. Electrochemical Micromachining Electrodeposition of Metals on Single Crystal Substrates 9. Molten Salt Electrochemical Deposition: Overview and Application 10. High-Temperature Electrochemical Synthesis of Intermetallides of Titanium in Molten Salts 11. Porous Silicon Formation: Theoretical Analysis
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