Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.

著者

• Alexander, Dale E.

書誌事項

Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.

editors, Dale E. Alexander ... [et al.]

（Materials Research Society symposium proceedings, v. 438）

Materials Research Society, c1997

注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

This book offers an international discussion of materials science issues related to ion-beam modification and processing. In addition to work on optical materials, metals, insulators and polymers, two areas of considerable interest are electronic materials and hard coatings. Substantial attention is focused on silicon technology and critical microstructural issues pertaining to ion-beam processing of silicon, such as transient-enhanced diffusion (TED) and defect/damage behavior, are examined. The emergence of plasma ion implantation (PII) as a major breakthrough for shallow-implant, large-area processing togther with the issue of hard coatings is also featured. Considerable discussion centers on the synthesis of novel metastable materials such as carbon nitride, amorphous carbon (DLC), multilayers and nanophases. Topics include: silicon; compound semiconductors, wide bandgap materials, silicides; plasma ion implantation, low-energy deposition techniques; nanocrystalline and other optical materials; polymers; novel applications and techniques; nitride films and hard coatings and oxidation and corrosion behavior.

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詳細情報

• NII書誌ID(NCID): BA30133175
• ISBN:
  • 1558993428
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pittsburgh, Pa.
• ページ数/冊数: xix, 727 p.
• 大きさ: 24 cm
• 親書誌ID:
  • BA00013775