1996 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD '96, September 2-4, 1996, Toyo University, Hakusan Campus, Tokyo, Japan

Author(s)

• International Conference on Simulation of Semiconductor Devices and Processes
• 応用物理学会 オウヨウ ブツリ ガッカイ
• IEEE Electron Devices Society

Bibliographic Information

1996 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD '96, September 2-4, 1996, Toyo University, Hakusan Campus, Tokyo, Japan

sponsored by Japan Society of Applied Physics, IEEE Electron Devices Society ; in cooperation with Institute of Electronics, Communication and Information Engineers, IEEE Electron Devices Tokyo Chapter

Business Center for Academic Societies, c1996 , Copies available at IEEE Service Center, c1996

• :softbound

Other Title

96TH8095

Note

"IEEE catalog number 96TH8095"--T.p. verso

Includes bibliographical references and index

• NCID: BA30263283
• ISBN:
  • 0780327454
• LCCN: 97110461
• Country Code: ja
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Tokyo, Japan,Piscataway, N.J.
• Pages/Volumes: xiv, 184 p.
• Size: 25 cm
• Classification:
  • LCC : IN PROCESS (UTILITY LOAD)
• Subject Headings:
  • LCSH : Semiconductors -- Mathematical models -- Congresses