1996 1st International Symposium on Plasma Process-Induced Damage, 13-14 May 1996, Santa Clara, California, USA

Author(s)

• International Symposium on Plasma Process-Induced Damage
• Cheung, Kin P.
• Nakamura, Moritaka
• Gabriel, Calvin T.
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

Bibliographic Information

1996 1st International Symposium on Plasma Process-Induced Damage, 13-14 May 1996, Santa Clara, California, USA

Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel, editors ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

Northern California Chapter of the American Vacuum Society, c1996

• :soft
• :micro

Other Title

96TH8142

Note

"IEEE catalog no. 96TH8142"--T.p. verso

Includes bibliographical references and index

Details

• NCID: BA30279308
• ISBN:
  • 0965157709
  • 0780330617
• LCCN: 96068444
• Country Code: us
• Title Language Code: eng
• Place of Publication: Sunnyvale, CA
• Pages/Volumes: 237 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductor wafers -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma radiation -- Congresses