Plasma processing of semiconductors
著者
書誌事項
Plasma processing of semiconductors
（NATO ASI series, Series E . Applied sciences ; no. 336）
Kluwer, c1997
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注記
Includes index
内容説明・目次
内容説明
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
目次
- Preface. Plasma Etching: Introduction to Plasma Etching
- T.D. Mantei. Plasma Chemistry, Basic Processes and PECVD
- D.L. Flamm. The Role of Ions in Reactive Ion Etching with Low Density Plasmas
- J.W. Coburn. SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas
- G.S. Oehrlein. Plasma Deposition: Introduction to Plasma Enhanced Chemical Vapor Deposition
- T.S. Cale, et al. Topography Evolution During Semiconductor Processing
- T.S. Cale, et al. Deposition of Amorphous Silicon
- J. Perrin. Plasma Sources: High Density Sources for Plasma Etching
- T.D. Mantei. Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications
- H. Oechsner. The Transition from Capacitive to Inductive to Wave Sustained Discharges
- R.W. Boswell, et al. Physics of Surface-Wave Discharges
- J. Margot, M. Moisan. Plasma-Surface Interactions: Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas
- J.W. Coburn. Plasma-Surface Interactions
- R. d'Agostino. Cl2 Plasma-Si Surface Interactions in Plasma Etching
- V.M. Donnelly, et al. Numerical Modeling: Particle in Cell Monte Carlo Collision Codes (PIC-MCC), Methods and Applications to Plasma Processing
- J.-P. Boeuf, A. Merad. Plasma Diagnostics: Optical Diagnostics of Processing Plasmas
- P.F. Williams. Optical Diagnostics of Plasmas: A Tool for Process Control
- N. Sadeghi, et al. Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas
- G.M.W. Kroesen. Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials
- J.A. Woollam. Mass Spectrometry of Reactive Plasmas
- J. Perrin. Less Conventional Processing Applications of Plasmas: Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated Optics Applications
- R.W. Boswell, et al. Remote Plasma Processing
- G.S. Oehrlein. Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer
- J. Margot, et al. Dusty Plasmas: Fundamental Aspects and Industrial Applications
- G.M.W. Kroesen. Industrial Application of Plasmas for Processing: Low Energy Plasma Beams for Semiconductor Technology
- H. Oechsner. Process Control Concepts
- S. Watts Butler. Issues and Solutions for Applying process Control to Semiconductor Manufacturing
- S. Watts Butler. Index.
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