Rapid thermal processing of semiconductors

著者

• Borisenko, V. E. (Viktor Evgen´ evich)
• Hesketh, P. J. (Peter J.)

書誌事項

Rapid thermal processing of semiconductors

Victor E. Borisenko, Peter J. Hesketh

（Microdevices : physics and fabrication technologies）

Plenum, c1997

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

目次

Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.

「Nielsen BookData」 より

• NII書誌ID(NCID): BA31689644
• ISBN:
  • 0306450542
• LCCN: 97003783
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: New York
• ページ数/冊数: xxii, 358 p.
• 大きさ: 26 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Design and construction
  • LCSH : Rapid thermal processing
• 親書誌ID:
  • BA01301028