Semiconductor technology : processing and novel fabrication techniques
著者
書誌事項
Semiconductor technology : processing and novel fabrication techniques
Wiley, c1997
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注記
"A Wiley-Interscience publication."
Includes bibliographical references and index
内容説明・目次
内容説明
The product of decades of Russian research in semiconductor technology, this invaluable book offers Western researchers and engineers a wide range of new techniques, recipes, and characterization methods that provide simpler, cheaper, and more effective solutions to problems in semiconductor processing and fabrication. Many of these approaches appear here for the first time in Western technological literature.
目次
- Introduction to Semiconductor Technology (E. Guk & N. Shmidt).
- Transmutation Doping of Semiconductors by Charged Particles (V. Kozlovskii & L. Zakharenkov).
- Polymer Diffusants in Semiconductor Technology (E. Guk, et al.).
- Rare--Earth Elements in the Technology of III--V Compounds (L. Zakharenkov, et al.).
- Intrinsic Point Defect Engineering in Silicon High--Voltage Power Device Technology (N. Sobolev).
- Isovalent Impurity Doping of Direct--Gap III--V Semiconductor Layers (V. Chaldyshev & S. Novikov).
- Surface Passivation of III--V Compounds by Inorganic Dielectrics and Polyimides (A. Gorelenok, et al.).
- Precision Profiling of Semiconductor Surfaces by Photochemical Etching (D. Goryachev, et al.).
- Index.
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