Introduction to microlithography

Author(s)

• Thompson, L. F.
• Willson, C. G. (C. Grant)
• Bowden, M. J.

Bibliographic Information

Introduction to microlithography

edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden

（ACS professional reference book）

American Chemical Society, 1994

2nd ed

Note

Includes bibliographical references and index

Description and Table of Contents

Description

Updated and expanded! Reviews the theory, materials, and processes that are used in the lithographic process. Opens with a brief historical introduction to the advances in microlithography. Discusses four major topics: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. Designed as a tutorial for researchers with no experience in the field, as well as those experienced in microlithography. Will also prove invaluable to those already involved in microlithography. Includes numerous references for more detailed reading on specific aspects of microlithography.

Table of Contents

• An Introduction to Lithography
• The Lithographic Process: The Physics
• Organic Resist Materials
• Resist Processing
• Plasma Etching

by "Nielsen BookData"

Details

• NCID: BA3402261X
• ISBN:
  • 0841228485
• LCCN: 93042023
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Washington, DC
• Pages/Volumes: xiv, 527 p.
• Size: 24 cm
• Subject Headings:
  • LCSH : Microlithography -- Congresses
  • LCSH : Photoresists -- Congresses
  • LCSH : Plasma etching -- Congresses
  • LCSH : Semiconductors -- Etching -- Congresses
• Parent Bibliography ID:
  • BA04443415