Micolithography fundamentals in semiconductor devices and fabrication technology
著者
書誌事項
Micolithography fundamentals in semiconductor devices and fabrication technology
Marcel Dekker, c1998
大学図書館所蔵 件 / 全4件
-
該当する所蔵館はありません
- すべての絞り込み条件を解除する
注記
Includes bibliographical references and index
内容説明・目次
内容説明
"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
目次
- Exposure systems in photolithography
- optical pattern transfer
- chemistry of photoresist materials
- practical processes in microlithography
- X-ray lithography
- electron-beam lithography
- variations in microlithographic process.
「Nielsen BookData」 より
