Plasma etching : fundamentals and applications

Author(s)

• 菅原, 実 スガワラ, ミノル
• Stansfield, Barry L.

Bibliographic Information

Plasma etching : fundamentals and applications

M. Sugawara ; with contributions from Barry L. Stansfield ... [et al.]

（Series on semiconductor science and technology, 7）（Oxford science publications）

Oxford University Press, 1998

Note

Includes bibliographical references and index

Details

• NCID: BA37045123
• ISBN:
  • 019856287X
• LCCN: 97039210
• Country Code: uk
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Oxford
• Pages/Volumes: viii, 347 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.85
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Semiconductors -- Etching
  • LCSH : Plasma etching
• Parent Bibliography ID:
  • BA06558586
  • BA00281843