In situ process diagnostics and intelligent materials processing : symposium held December 2-5, 1997, Boston, Massachusetts, U.S.A.
著者
書誌事項
In situ process diagnostics and intelligent materials processing : symposium held December 2-5, 1997, Boston, Massachusetts, U.S.A.
（Materials Research Society symposium proceedings, v. 502）
Materials Research Society, 1998
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
This book, first published in 1998, focuses on the rapidly developing field of sensor technology for process monitoring and control during fabrication of advanced materials and structures. Research in sensor driven, closed-loop control of the fabrication process (i.e., process-state monitoring), as well as product-state (e.g., wafer-state) monitoring are discussed. Featured are process techniques that include chemical vapor deposition (CVD), metalorganic chemical vapor deposition (MOCVD), plasma-enhanced chemical vapor deposition (PECVD), molecular beam epitaxy (MBE), rapid thermal processing (RTP), reactive-ion and plasma etching, electron beam evaporation, pulsed laser deposition (PLD), and sputtering. Materials of interest include electronic and optical thin films such as semiconductors, epitaxial oxides, metals and dielectrics, as well as particles and nanostructured materials. Sensing techniques for monitoring variables such as temperature, composition, optical properties, film thickness and particle-size distribution are highlighted. Topics include: sensor technologies and semiconductor diagnostics; sensor technologies and thin-film diagnostics; in situ diagnostics of oxide film growth and processes and intelligent processing of electronic ceramics.
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