Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.

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Bibliographic Information

Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.

editors, Ruud Schropp

(Materials Research Society symposium proceedings, v. 507)

Materials Research Society, c1999

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

Although this is the 16th volume in a long-standing and successful series, the focus is no longer limited to hydrogenated amorphous silicon (a-Si:H). The distinction between short- and medium-range order, and between homogeneous and heterogeneous semiconductor materials, is indeed too difficult to maintain. Instead, the volume covers amorphous and microcrystalline silicon from materials physics to new applications. Papers from a joint session with a symposium on Flat-Panel Display Materials and Large-Area Processes are included. The volume also features special focused sessions on heterogeneous materials, color sensors and radiation imaging, and parameter extraction and device modelling. Topics include: amorphous and polycrystalline thin-film transistors; solar cells; color and X-ray sensors, novel devices, luminescence and sensitization; device modelling and parameter extraction; growth, alloys and clathrates; metastability, hydrogen, atomic and electronic structure; defects and charge transport; and heterogeneous silicon - formation, properties and devices.

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Details

  • NCID
    BA40934920
  • ISBN
    • 1558994130
  • Country Code
    us
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Warrendale
  • Pages/Volumes
    xx, 1009 p.
  • Size
    24 cm
  • Parent Bibliography ID
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