Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Author(s)

• Aizaki, Naoaki
• Photomask Japan
• BACUS (Technical group)
• Ōyō Butsuri Gakkai
• Society of Photo-optical Instrumentation Engineers. Japan Chapter

Bibliographic Information

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3096）

SPIE, c1997

Other Title

Photomask and X-ray mask technology 4

Photomask and X-ray mask technology four

Note

Includes bibliographic references and author index

Details

• NCID: BA41040542
• ISBN:
  • 0819425168
• LCCN: 98122044
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Washington
• Pages/Volumes: xiii, 504 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M4
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X