Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

著者

• Aizaki, Naoaki
• Photomask Japan
• BACUS (Technical group)
• Ōyō Butsuri Gakkai
• Society of Photo-optical Instrumentation Engineers. Japan Chapter

書誌事項

Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan

Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3096）

SPIE, c1997

タイトル別名

Photomask and X-ray mask technology 4

Photomask and X-ray mask technology four

注記

Includes bibliographic references and author index

詳細情報

• NII書誌ID(NCID): BA41040542
• ISBN:
  • 0819425168
• LCCN: 98122044
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: xiii, 504 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M4
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Masks (Electronics) -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X