1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA

著者

• International Symposium on Plasma Process-Induced Damage (2nd : 1997 : Monterey, Calif.)
• Cheung, Kin P.
• Nakamura, Moritaka
• Gabriel, Calvin T.
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

書誌事項

1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA

editors, Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

Northern California Chapter of the American Vacuum Society, c1997

• : softbound
• : microfiche

タイトル別名

P2ID

2nd International Symposium on Plasma Process-Induced Damage

注記

"IEEE catalog no. 97TH8265"--T.p. verso

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA41124824
• ISBN:
  • 0965157717
  • 0780338227
• LCCN: 97065930
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Sunnyvale, Calif.
• ページ数/冊数: i, 259 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses