1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA

Author(s)

• International Symposium on Plasma Process-Induced Damage (2nd : 1997 : Monterey, Calif.)
• Cheung, Kin P.
• Nakamura, Moritaka
• Gabriel, Calvin T.
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

Bibliographic Information

1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA

editors, Kim P. Cheung, Moritaka Nakamura, and Calvin T. Gabriel ; technical co-sponsors, IEEE/Electron Devices Society, American Vacuum Society, Japanese Society of Applied Physics

Northern California Chapter of the American Vacuum Society, c1997

• : softbound
• : microfiche

Other Title

P2ID

2nd International Symposium on Plasma Process-Induced Damage

Note

"IEEE catalog no. 97TH8265"--T.p. verso

Includes bibliographical references and index

Details

• NCID: BA41124824
• ISBN:
  • 0965157717
  • 0780338227
• LCCN: 97065930
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Sunnyvale, Calif.
• Pages/Volumes: i, 259 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses