Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes

著者

• International Symposium on Thin Film Materials, Processes, Reliability, and Applications: Thin Film Processes
• Mathad, G. S.
• Meyyappan, M.
• Engelhardt, M. (Michael)
• Electrochemical Society. Dielectric Science and Technology Division
• Electrochemical Society. Electronics Division
• Electrochemical Society. Electrodeposition Division
• Electrochemical Society. Meeting
• International Society of Electrochemistry. Meeting

書誌事項

Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes

editors, G.S. Mathad, M. Meyyappan, M. Engelhardt ; Dielectric Science & Technology, Electronics, and Electrodeposition Divisions

（Proceedings / [Electrochemical Society], v. 97-30）

Electrochemical Society, c1998

タイトル別名

Thin film materials, processes, reliability, and applications: thin film processes

注記

"Held as a part of the Joint International Meeting of the Electrochemical Society, Inc. and the International Society for Electrochemistry in Paris, France, Aug. 31-Sept. 5, 1997"--P. iii

Includes bibliographical references and indexes

• NII書誌ID(NCID): BA43162777
• ISBN:
  • 1566771838
• LCCN: 98158683
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, NJ
• ページ数/冊数: ix, 370 p.
• 大きさ: 23 cm
• 分類:
  • LCC : TK7872.T55
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Thin film devices -- Design and construction -- Congresses
  • LCSH : Thin films -- Congresses
  • LCSH : Plasma etching -- Congresses
• 親書誌ID:
  • BA01323290