Microlithography : science and technology

著者

    • Sheats, James R.
    • Smith, Bruce W.

書誌事項

Microlithography : science and technology

edited by James R. Sheats, Bruce W. Smith

Marcel Dekker, c1998

大学図書館所蔵 件 / 全4件

この図書・雑誌をさがす

注記

Includes bibliographical references and index

内容説明・目次

内容説明

This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.

目次

EXPOSURE SYSTEMS System Overview of Optical Steppers and Scanners, M.S. Hibbs Optical Lithography Modeling, C.A. Mack Optics for Photolithography, B.W. Smith Krypton Fluoride Excimer Laser for Advanced Microlithography, P. Das and U. Sengupta Alignment and Overlay, G.M. Gallatin Electron Beam Lithography Systems, G. Owen and J.R. Sheats X-Ray Lithography, T. Ueno and J.R. Sheats RESISTS AND PROCESSING Chemistry of Photoresist Materials, T. Ueno Resist Processing, B.W. Smith Multilayer Resist Technology, B.W. Smith and M. Hanratty Dry Etching of Photoresists, R.R. Kunz METROLOGY AND NANOLITHOGRAPHY Dimensional Metrology, H.M. Marchman E-Beam and Proximal Probe Processes for Nanolithography, E.A. Dobisz, F.K. Perkins, and M.C. Peckerar

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