Microlithography : science and technology
Author(s)
Bibliographic Information
Microlithography : science and technology
Marcel Dekker, c1998
Available at 4 libraries
  Aomori
  Iwate
  Miyagi
  Akita
  Yamagata
  Fukushima
  Ibaraki
  Tochigi
  Gunma
  Saitama
  Chiba
  Tokyo
  Kanagawa
  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
  Shizuoka
  Aichi
  Mie
  Shiga
  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
  China
  Thailand
  United Kingdom
  Germany
  Switzerland
  France
  Belgium
  Netherlands
  Sweden
  Norway
  United States of America
Note
Includes bibliographical references and index
Description and Table of Contents
Description
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
Table of Contents
EXPOSURE SYSTEMS
System Overview of Optical Steppers and Scanners, M.S. Hibbs
Optical Lithography Modeling, C.A. Mack
Optics for Photolithography, B.W. Smith
Krypton Fluoride Excimer Laser for Advanced Microlithography, P. Das and U. Sengupta
Alignment and Overlay, G.M. Gallatin
Electron Beam Lithography Systems, G. Owen and J.R. Sheats
X-Ray Lithography, T. Ueno and J.R. Sheats
RESISTS AND PROCESSING
Chemistry of Photoresist Materials, T. Ueno
Resist Processing, B.W. Smith
Multilayer Resist Technology, B.W. Smith and M. Hanratty
Dry Etching of Photoresists, R.R. Kunz
METROLOGY AND NANOLITHOGRAPHY
Dimensional Metrology, H.M. Marchman
E-Beam and Proximal Probe Processes for Nanolithography, E.A. Dobisz, F.K. Perkins, and M.C. Peckerar
by "Nielsen BookData"