Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
著者
書誌事項
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
（Materials Research Society symposium proceedings, v. 567）
Materials Research Society, 1999
大学図書館所蔵 全8件
注記
Includes bibliographical references