書誌事項

Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing

editors, S. Raghavan, R.L. Opila, L. Zhang ; Electronics and Dielectric Science and Technology Divisions [of the Electrochemical Society]

(Proceedings / [Electrochemical Society], v. 98-7)

Electrochemical Society, c1998

タイトル別名

Chemical mechanical planarization in integrated circuit device manufacturing

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注記

"Electronics and Dielectric Science and Technology Divisions."

"This volume contains most of the papers presented at the Second International Symposium on Chemical Mechanical Planarization (CMP) in Integrated Circuit (IC) Device Manufacturing held at the 193rd Annual Meeting of Electrochemical Society in San Diego during May 5-7, 1998."

Includes bibliographical references and indexes

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  • Proceedings

    [Electrochemical Society]

    Electrochemical Society

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