Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A.

書誌事項

Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A.

editors, David E. Laughlin ... [et al.]

(Materials Research Society symposium proceedings, v. 562)

Materials Research Society, c1999

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注記

Includes bibliographical references

内容説明・目次

内容説明

The unprecedented growth in the semiconductor, electronics and storage industries is the result of continued miniaturization of circuit devices, increases in chip functionality, and increased storage capacity and performance, along with a decrease in per-function cost. Hardware shrinkage has taken place, leading to similar decreases in the dimensions of interconnection wires, contact metallization and magnetic storage footprints. The increasingly important role of surfaces, interfaces, defects and impurities has raised serious materials questions about how to control the properties of polycrystalline thin films used in applications requiring tight performance tolerances. The understanding of polycrystalline film structures during growth, and the evolution of various film properties with time and temperature, is critical to the successful design and development of smaller devices. This book, first published in 1999, highlights the directions taken to understand and control the properties of polycrystalline materials. Topics include: magnetic thin films; microstructure, texture and stress; copper microstructure; nanocrystalline magnetic thin films and thin-film permanent magnets.

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詳細情報

  • NII書誌ID(NCID)
    BA44649198
  • ISBN
    • 1558994696
  • LCCN
    99049143
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Warrendale, PA
  • ページ数/冊数
    xi, 348 p.
  • 大きさ
    24 cm
  • 親書誌ID
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