集積回路パターン形成におけるリフトオフプロセスの研究
Author(s)
Bibliographic Information
集積回路パターン形成におけるリフトオフプロセスの研究
（海外技術資料調査集, data no. M-2151-セット(M)）
材料技術資料センター, [19--]
- Title Transcription
-
シュウセキ カイロ パターン ケイセイ ニ オケル リフトオフ プロセス ノ ケンキュウ
Available at / 1 libraries
-
No Libraries matched.
- Remove all filters.
Search this Book/Journal
Note
Title from cover
Includes bibliographical references
Contents of Works
- Silicon lift-off technique / R.J. Bergeron
- Lift off processes for dense VLSI using polyimide auxiliary layer / Thomas E. Wade
- Negative silicon lift-off technique / R.J. Bergeron
- New chemical formulation and its use in lift-off technology / A. Mayeux and R. Mitte
- Low temperature lift-off process / S.D. Emmanuel
- Lift-off techniques for fine line metal patterning / by J.M. Frary and P. Seese
- Image reversal lift-off process / C.J. Hamel, M.W. MacIntyre and W.T. Motsiff
- High temperature lift-off structure / N.P. Marmillion, C.G. Pochop and A.F. Puttlitz
- In situ metal lift-off structure / R.J. Bergeron ... [et al.]
- Process for low pressure sputter deposition lift-off technology / N. Bojarczuk
- Single-step lift-off process using chlorobenzene soak on AZ4000 resists / A. Fathimulla
- Wavelength-controlled lift-off process / D.A. Badami, A.S. Bergendahl and M.C. Hakey
- Photoresist structure for lifting off sputtered metal films / C.T. Horng, L.M. Lane and J. Lo
- Improved photoresist structure for lift-off techniques / D.P. Nadeau
- A double exposure technique for positive resist lift-off / Russell B. Rauch
- The mechanism of single-step liftoff with chlorobenzene in a diazo-type resist / R.M. Halverson, M.W. MacIntyre, W.T. Motsiff
- Process control of the chlorobenzene single-step liftoff preocess with a diazo-type resist / George G. Collins, Cary W. Halsted
- A high resolution double layer photoresist structure for lift-off technology / C. Li and J. Richards
- Lift-off of thick metal layers using multilayer resist / S.P. Lyman, J.L. Jackel, and P.L. Liu
- Method for determining top and bottom dimensions of lift-off resist / W.J. Horkans and D.J. Webb
- Method of measuring overhanging photoresist lift-off patterns in scanning electron microscope / S.W. Harks and J.M. Morrissey
- High conductivity silicide on polycrystalline silicon prepared by lift-off-reactive sputter etching / E. Kinsbron, D.B. Fraser and F. Vratny