Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.

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書誌事項

Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.

editors, Howard M. Branz ... [et al.]

(Materials Research Society symposium proceedings, v. 557)

Materials Research Society, c1999

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si:H films. Important experimental observations on metastable effects in a-Si:H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other devices.

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詳細情報

  • NII書誌ID(NCID)
    BA45709025
  • ISBN
    • 1558994645
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Warrendale
  • ページ数/冊数
    xviii, 888 p.
  • 大きさ
    24 cm
  • 親書誌ID
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