1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA

Author(s)

• International Symposium on Plasma Process-Induced Damage
• Nakamura, Moritaka
• Dao, Leanne Thuy Lien
• Hook, Terence
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

Bibliographic Information

1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA

editors, Moritaka Nakamura, Thuy Dao, and Terence Hook ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japan Society of Applied Physics

Northern California Chapter of the American Vacuum Society, c1998

• :softbound
• :microfiche

Note

"P[2]ID"--Cover

"Plasma process-induced damage"--Cover

"IEEE Catalog Number 98EX100"--Verso of t.p

Includes bibliographical references and author index

Details

• NCID: BA46666686
• ISBN:
  • 0965157725
  • 0780342666
• LCCN: 98065928
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Sunnyvale, CA
• Pages/Volumes: 234 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses