1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA

著者

• International Symposium on Plasma Process-Induced Damage
• Nakamura, Moritaka
• Dao, Leanne Thuy Lien
• Hook, Terence
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

書誌事項

1998 3rd International Symposium on Plasma Process-Induced Damage, June 4-5, 1998, Honolulu, Hawaii, USA

editors, Moritaka Nakamura, Thuy Dao, and Terence Hook ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japan Society of Applied Physics

Northern California Chapter of the American Vacuum Society, c1998

• :softbound
• :microfiche

注記

"P[2]ID"--Cover

"Plasma process-induced damage"--Cover

"IEEE Catalog Number 98EX100"--Verso of t.p

Includes bibliographical references and author index

詳細情報

• NII書誌ID(NCID): BA46666686
• ISBN:
  • 0965157725
  • 0780342666
• LCCN: 98065928
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Sunnyvale, CA
• ページ数/冊数: 234 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses