2000 Symposium on VLSI Technology : digest of technical papers, June 13-15, 2000, Honolulu

著者

• Symposium on VLSI Technology
• 応用物理学会 オウヨウ ブツリ ガッカイ
• IEEE Electron Devices Society

書誌事項

2000 Symposium on VLSI Technology : digest of technical papers, June 13-15, 2000, Honolulu

the IEEE Electron Devices Society, the Japan Society of Applied Physics

Widerkehr and Associates, c2000

• :softbound
• :casebound

タイトル別名

00CH37104, 00CB37104

注記

"JSAP cat. no. 001213"

"IEEE cat no. 00CH37104"

Includes bibliographical references and index

内容説明・目次

内容説明

These conference prodeedings cover such topics as: copper interconnects; novel devices; high-K dielectrics; process technology; embedded DRAM; gate electrode engineering; DRAM cells; gate oxide scaling and reliability; DRAM capacitors; and high performance RF.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA48334621
• ISBN:
  • 0780363051
  • 078036306X
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Gaithersburg
• ページ数/冊数: xv, 226 p.
• 大きさ: ill. ; 28 cm