Handbook of semiconductor manufacturing technology
著者
書誌事項
Handbook of semiconductor manufacturing technology
Marcel Dekker, c2000
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."
目次
- Overview of semiconductor devices
- introduction to semiconductor equipment
- silicon materials
- surface preparation
- ion implantation
- dopant diffusion
- oxidation
- silicidation
- rapid thermal processing
- overview of interconnect
- chemical vapourdeposition
- alternate interlevel dielectrics
- polymide dielectrics
- physical vapour deposition
- chemical-mechanical polish
- optical lithography
- photoresist materials and processing
- x-ray lithography
- electron-beam lithography
- photomask fabrication
- plasma etching
- equipment reliability
- overview of process control
- in-line metrology
- in-situ metrology
- yield modelling
- yield management
- electrical, physical and chemical characterization
- failure analysis. Appendices: glossary of manufacturing terms
- acronyms used in semiconductor manufacturing
- standards and specifications
- units of measure and conversion tables
- useful constants.
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