Handbook of plasma immersion ion implantation and deposition
Author(s)
Bibliographic Information
Handbook of plasma immersion ion implantation and deposition
J. Wiley, c2000
- : hbk
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Note
"A Wiley-Interscience publication."
Includes bibliographical references and index
Description and Table of Contents
Description
This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.
Table of Contents
Introduction (J. Conrad).
FUNDAMENTALS.
Fundamentals of Plasmas and Sheaths (M. Lieberman).
Ion Implantation and Thin-Film Deposition (M. Nastasi, et al.).
Fundamentals of Plasma Immersion Ion Implantation and Deposition (B. Wood, et al.).
Materials Characterization and Testing Methods-A Brief Survey (K. Walter, et al.).
TECHNOLOGY.
Design of a PIII&D Processing Chamber (J. Matossian, et al.).
Plasma Sources (A. Anders, et al.).
Pulser Technology (D. Goebel, et al.).
Health and Safety Issues Related to PIII&D (D. Beals, et al.).
APPLICATIONS.
Nonsemiconductor Applications of PIII&D (K. Sridharan, et al.).
Semiconductor Applications (P. Chu, et al.).
Appendices.
Index.
by "Nielsen BookData"
