Fundamental mechanisms of low-energy-beam-modified surface growth and processing : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
著者
書誌事項
Fundamental mechanisms of low-energy-beam-modified surface growth and processing : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
（Materials Research Society symposium proceedings, v. 585）
Materials Research Society, 2000
大学図書館所蔵 件 / 全10件
-
該当する所蔵館はありません
- すべての絞り込み条件を解除する
注記
Includes bibliographical references and index
内容説明・目次
内容説明
Many technologically important thin-film growth, processing and surface modification techniques employ low-energy (hyperthermal and keV) particles. Energetic particle sources include ion beams (for growth and sputter etching), cluster beams, pulsed laser beams and plasmas. Phenomenological evidence suggests that the use of these energetic particles can change growth modes and provide control of surface morphology and film properties. The key to improving this control is to better understand how the energetic beams influence film, surface properties and the microscopic mechanisms responsible for beam-induced effects. This book addresses growth, ion erosion, surface smoothing, texturing and pattern formation, etching, structural stabilization and stress relaxation. Materials modification from the nanoscale to the mesoscale and macroscale are discussed as well as technological applications including thin-film transistors, microelectronics, materials for X-ray mirrors, high-temperature superconductors, sensors and diamond-like coatings. Papers on modeling and analysis of these processes using techniques including molecular dynamic simulations are also included..
「Nielsen BookData」 より