1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA

Author(s)

• International Symposium on Plasma Process-Induced Damage
• Koyanagi Mitsumasa
• Dao, Leanne Thuy Lien
• Hook, Terence
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

Bibliographic Information

1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA

editors, Thuy Dao, Mitsumasa Koyanagi, Terence Hook ; technical co-sponsors,IEEE/Electron Devices Society, American Vacuum Society, Japan Society of Applied Physics

the American Vacuum Society, c1999

• :softbound

Other Title

CV:P2ID

99TH8395

Note

"P2ID"--Cover

"Plasma process-induced damage"--Cover

"IEEE Catalog Number 99TH8395"

Includes bibliographical references and author index

Details

• NCID: BA50938382
• ISBN:
  • 0965157733
• LCCN: 98068111
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Sunnyvale, CA
• Pages/Volumes: 211 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses