1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA

著者

• International Symposium on Plasma Process-Induced Damage
• Koyanagi Mitsumasa
• Dao, Leanne Thuy Lien
• Hook, Terence
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

書誌事項

1999 4th International Symposium on Plasma Process-Induced Damage, May 9-11, 1999, Monterey, California, USA

editors, Thuy Dao, Mitsumasa Koyanagi, Terence Hook ; technical co-sponsors,IEEE/Electron Devices Society, American Vacuum Society, Japan Society of Applied Physics

the American Vacuum Society, c1999

• :softbound

タイトル別名

CV:P2ID

99TH8395

注記

"P2ID"--Cover

"Plasma process-induced damage"--Cover

"IEEE Catalog Number 99TH8395"

Includes bibliographical references and author index

内容説明・目次

内容説明

This text constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.

目次

• Plasma Equipment
• Pattern Dependent Charging Effects
• Electron Shading
• Device Characterization
• Charging Theory and Thin Gate Oxides
• Equipment Enhancement
• Thin Gate Oxide and Dielectrics
• Frequency and Time Modulation Effects
• Backend Process Integration
• Charging Mechanisms and Measurements 001 0780351894

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA50938382
• ISBN:
  • 0965157733
• LCCN: 98068111
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Sunnyvale, CA
• ページ数/冊数: 211 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses