2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA
Author(s)
Bibliographic Information
2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA
Institute of Electrical and electronics Engineers, c2000
- :softbound
- Other Title
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SISPAD 2000
00TH8502
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Note
"IEEE catalog number 00TH8502"--T.p. verso
Includes bibliographical references and index
Description and Table of Contents
Description
The proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2000. Topics include: device simulation; quantum effects and novel devices; process simulation; lithography simulation; user interfaces and visualization; calibration; and more.
by "Nielsen BookData"
