2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA
著者
書誌事項
2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA
Institute of Electrical and electronics Engineers, c2000
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- タイトル別名
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SISPAD 2000
00TH8502
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注記
"IEEE catalog number 00TH8502"--T.p. verso
Includes bibliographical references and index
内容説明・目次
内容説明
The proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2000. Topics include: device simulation; quantum effects and novel devices; process simulation; lithography simulation; user interfaces and visualization; calibration; and more.
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