Run-to-run control in semiconductor manufacturing

著者

• Moyne, James
• Del Castillo, Enrique
• Hurwitz, Arnon Max

書誌事項

Run-to-run control in semiconductor manufacturing

edited by James Moyne, Enrique Del Castillo, Arnon Max Hurwitz

CRC Press, c2001

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

目次

Introduction. Background. Identifying Target Applications for Run-to-Run Control. Developing a Run-to-Run Solution: Run-to-Run Algorithms. Developing a Run-to-Run Solution: Practical Extensions to Algorithms. Developing and Deploying Run-to-Run Solutions: Integrating Control. Run-to-Run Control System Deployment Case Studies. Advanced Topics. Conclusions. References.

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詳細情報

• NII書誌ID(NCID): BA51139205
• ISBN:
  • 0849311780
• LCCN: 00059910
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Boca Raton, Fla.
• ページ数/冊数: 348 p.
• 分類:
  • LCC : TK7871.85
  • DC21 : 621.3815/2
  • DC21 : 621.38152
• 件名:
  • LCSH : Semiconductors -- Design and construction
  • LCSH : Semiconductor industry -- Production control
  • LCSH : Electronic packaging
  • LCSH : Production management