書誌事項

Modern electroplating

edited by Mordechay Schlesinger, Milan Paunovic

(The Electrochemical Society series)

John Wiley, c2000

4th ed

大学図書館所蔵 件 / 18

この図書・雑誌をさがす

注記

"Sponsored by the Electrochemical Society, Inc."

"A Wiley-Interscience publication."

Includes bibliographical references and index

内容説明・目次

内容説明

A new collection of authoritative contributions on the state of the art of electrochemical deposition Since the last edition of Modern Electroplating was published over a quarter century ago, electrochemical deposition has evolved into a mature science, with many new and potential applications. To address these developments, Modern Electroplating, Fourth Edition presents an entirely new collection of contributions on a wide range of cutting--edge topics, from electrodeposition of semiconductors to environmental considerations. Geared to experienced deposition practitioners and novices alike, the new edition provides clear, thorough, up--to--date explanations of the principles and applications of highly relevant deposition techniques. It not only replaces the Third Edition, a very useful resource on electroplating processes, but, in addition, highlights the transition in the electronics industry from physical to electrochemical methods, especially with regard to next--generation technologies such as copper interconnect. Coverage includes: Electrodeposition of various metals and metal alloys Electrodeposition of semiconductors and electrodeposition on nonconductors Electrodeposition of conductive polymers Electroless deposition of various metals and alloys Preparation procedures for deposition Manufacturing technologies, monitoring, testing, and control Deposition and the environment

目次

Fundamental Considerations. (M. Paunovic, et al.). Electrodeposition of Copper (J. Dini). Electrodeposition of Nickel (G. Di Bari). Electrodeposition of Gold (P. Kohl). Electroless and Electrodeposition of Silver (M. Schlesinger). Tin and Tin Alloys for Lead--Free Solder (Y. Zhang & J. Abys). Electrodeposition of Chromium (N. Mandich & D. Snyder). Electrodeposition of Lead and Lead Alloys (M. Jordan). Electrodeposition of Tin--Lead Alloys (M. Jordan). Electrodeposition of Zinc and Zinc Alloys (R. Winand). Electrodeposition of Iron and Iron Alloys (M. Izaki). Electrodeposition of Palladium and Palladium Alloys (J. Abys & C. Dullaghan). Nickel Alloys, Cobalt, and Cobalt Alloys (G. Di Bari). Electrodeposition of Semiconductors, (T. Schlesinger). Deposition on Nonconductors (M. Schlesinger). Electrodeposition of Organic Films: Conductive Polymers (T. Osaka, et al.). Electroless Deposition of Copper (M. Paunovic). Electroless Deposition of Nickel (M. Schlesinger). Electroless Deposition of Cobalt Alloy Films (T. Osaka, et al.). Electroless Deposition of Palladium and Platinum (I. Ohno). Electroless Deposition of Gold (Y. Okinaka & M. Kato). Electroless Deposition of Alloys (I. Ohno). Preparation for Deposition (D. Snyder). Manufacturing Technologies (D. Turner). Monitoring and Control (D. Turner). Environmental Aspects of Electrodeposition (M. Tomkiewicz). Appendix. Index.

「Nielsen BookData」 より

関連文献: 1件中  1-1を表示

詳細情報

  • NII書誌ID(NCID)
    BA51729694
  • ISBN
    • 9780471168249
  • LCCN
    00042272
  • 出版国コード
    us
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    New York
  • ページ数/冊数
    xiv, 868 p.
  • 大きさ
    26 cm
  • 分類
  • 件名
  • 親書誌ID
ページトップへ