Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

書誌事項

Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

edited by Glenn D. Kubiak and Don R. Kania ; sponsored by Optical Society of America

(OSA trends in optics and photonics, v. 4)

Optical Society of America, c1996

  • : pbk

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注記

Includes bibliographical references (p. 222-232) and indexes

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