Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

Author(s)

• Kubiak, Glenn D.
• Kania, Don R.
• Optical Society of America

Bibliographic Information

Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts

edited by Glenn D. Kubiak and Don R. Kania ; sponsored by Optical Society of America

（OSA trends in optics and photonics, v. 4）

Optical Society of America, c1996

• : pbk

Note

Includes bibliographical references (p. 222-232) and indexes

• NCID: BA52291180
• ISBN:
  • 1557524351
• LCCN: 95072755
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Washington, D.C.
• Pages/Volumes: ix, 235 p.
• Size: 28 cm
• Classification:
  • LCC : TS517.2
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Optical coatings -- Congresses
  • LCSH : Photolithography -- Congresses
  • LCSH : Ultraviolet radiation -- Industrial applications -- Congresses
  • LCSH : Interferometry -- Congresses
  • LCSH : Lasers -- Industrial applications -- Congresses
• Parent Bibliography ID:
  • BA29850543