Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium

著者

• Mathad, G. S.
• Hess, Dennis W.
• Electrochemical Society. Industrial Electrolysis and Electrochemical Engineering Division

書誌事項

Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium

editor, G.S. Mathad ; assistant editors, D.W. Hess ... [et al.]

（Proceedings / [Electrochemical Society], v. 99-30）

Electrochemical Society, c2000

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA53255819
• ISBN:
  • 1566772532
• LCCN: 00101648
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, NJ
• ページ数/冊数: x, 378 p.
• 大きさ: 24 cm
• 親書誌ID:
  • BA01323290