Plasma processing and dusty particles : proceedings of the IV European Workshop on Dusty and Colloidal Plasmas, Costa da Caparica, Portugal, June 3-5, 2000

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書誌事項

Plasma processing and dusty particles : proceedings of the IV European Workshop on Dusty and Colloidal Plasmas, Costa da Caparica, Portugal, June 3-5, 2000

guest editors, R. Martins ...[et al.]

(Materials science forum, v. 382)

Trans Tech Publications, c2001

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注記

Includes bibliographical refernces and indexes

"Arranged and organized by Faculty of Science and Technology of New University of Lisbon and UNINOVA, under the sponsorship of the Foundation of Cience and Technology of the Minister of Science and Technology of Portugal, Caloust Gulbenkian Foundation, Luso American Foundation for the Development (FLAD) and North Atlantic Treat Organization, NATO-Science for Stability" --T.p.

内容説明・目次

内容説明

Volume is indexed by Thomson Reuters CPCI-S (WoS). These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.

目次

Processing of Thin Film Silicon Solar Cells under Ionic Bombardment Control Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films Silicon Films Produced by PECVD under Powder Formation Conditions Microgravity Experiments in the MIR Space Station Laser-Excited Mach Cones in Plasma Crystals Laser Excitation of Oscillations and Waves in Dust Crystals: a Tutorial Charging Kinetics of Dust Particles with a Variable Mass Influence of Dust Particles on Sheaths in an Oblique Magnetic Field Radio Frequency Discharge with Dust Particles

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詳細情報

  • NII書誌ID(NCID)
    BA54367090
  • ISBN
    • 0878498885
  • 出版国コード
    sz
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Uetikon-Zuerich, Switzerland
  • ページ数/冊数
    79 p.
  • 大きさ
    25 cm
  • 親書誌ID
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