The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000

Author(s)

• International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface
• Massoud, Hisham Z.
• Electrochemical Society. Electronics Division
• Electrochemical Society. Dielectric Science and Technology Division

Bibliographic Information

The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000

editors, Hisham Z. Massoud ... [et al.]

（Proceedings / [Electrochemical Society], v. 2000-2）

Electrochemical Society, c2000

Note

"Electronics Division and Dielectrics Science and Technology Division"--on T.p

Includes bibliographical references and indexes

Details

• NCID: BA54427578
• ISBN:
  • 1566772672
• LCCN: 00102038
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pennington, N.J.
• Pages/Volumes: xiv, 539 p.
• Size: 27 cm
• Parent Bibliography ID:
  • BA01323290