The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000

著者

• International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface
• Massoud, Hisham Z.
• Electrochemical Society. Electronics Division
• Electrochemical Society. Dielectric Science and Technology Division

書誌事項

The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000

editors, Hisham Z. Massoud ... [et al.]

（Proceedings / [Electrochemical Society], v. 2000-2）

Electrochemical Society, c2000

注記

"Electronics Division and Dielectrics Science and Technology Division"--on T.p

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA54427578
• ISBN:
  • 1566772672
• LCCN: 00102038
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, N.J.
• ページ数/冊数: xiv, 539 p.
• 大きさ: 27 cm
• 親書誌ID:
  • BA01323290