Advances in plasma-grown hydrogenated films
Author(s)
Bibliographic Information
Advances in plasma-grown hydrogenated films
（Thin films and nanostructures, v. 30）
Academic Press, c2002
Available at / 22 libraries
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The Institute for Solid State Physics Library. The University of Tokyo.図書室
428.7:P5:307210187097
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Note
Includes bibliographical references and index
Description and Table of Contents
Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats
Table of Contents
Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications
Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon-Nitrogen Films
by "Nielsen BookData"
